# GOALI: Fundamental Understanding of Metal-Nitride Thin Films using Plasma-Enhanced Atomic Layer Deposition

**Budget Signal Score:** 55/100

| Field | Value |
|---|---|
| Institution | Lehigh University |
| Location | BETHLEHEM, PA |
| Project | GOALI: Fundamental Understanding of Metal-Nitride Thin Films using Plasma-Enhanced Atomic Layer Deposition |
| Award amount | $680,000 |
| Obligated so far | $680,000 |
| Awarded | 2026-08-18 |
| Period | 2026-09-01 to 2029-08-31 |
| Program | AM-Advanced Manufacturing |
| Directorate / division | ENG / CMMI |
| Award ID | 2600477 |

## Why this score
- Award of $300K or more.
- Equipment- and compute-heavy field.

Source: U.S. National Science Foundation Awards API (https://www.nsf.gov/awardsearch/showAward?AWD_ID=2600477). Last refreshed: 2026-11-04T18:13:44.963Z.
Award data comes from the NSF Awards API and may be amended by NSF. Institution-level only; investigator contact details are not included. Informational only.